Project Resources

The team benefits from access to the SIMS laboratory through its collaboration with Dr. Patricia Nieva, as well as the following lab facilities, equipment, and software provided by the Nanotechnology Engineering undergraduate department:

  • Class 10,000 clean room
  • Trion Technology Orion III Plasma Enhanced Chemical Vapor Deposition System
  • Trion Technology Phantom III Reactive Ion Etch System
  • Intlvac Nanochrome Physical Vapor Deposition Sputter System
  • Suss Microtec MJB4 4” Mask Aligner
  • Headway Research Inc. Photoresist Spinner
  • Veeco Dektac Stylus Profiler
  • Hitachi High Technologies S-3400N  Scanning Electron Microscope
  • COMSOL Multiphysics 3.4 and MATLAB 7.0.1
  • Power supplies, function generators, oscilloscopes, and LCR meters
  • Wet Chemistry Laboratory

Based on preliminary estimates, the minimum expected cost of tools and materials needed for this project is $3000. The following list highlights the most expensive materials and processes required, which make up a large portion of the total budget:
  • SU-8 photoresist, developer and remover
  • Lift-Off photoresist, developer and remover
  • Chrome/Gold evaporation coating for electrode fabrication
  • Photo Mask fabrication
  • Sylgard 184 PDMS 
  • 4" glass and silicon wafers
  • 6 um polymer micro beads for flow testing